• 文献标题:   Soliton-Dependent Electronic Transport across Bilayer Graphene Domain Wall
  • 文献类型:   Article
  • 作  者:   JIANG LL, WANG S, ZHAO SH, CROMMIE M, WANG F
  • 作者关键词:   bilayer graphene, layerstacking domain wall, scanning voltage microscope, topological defect
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Univ Calif Berkeley
  • 被引频次:   0
  • DOI:   10.1021/acs.nanolett.0c01911
  • 出版年:   2020

▎ 摘  要

Layer-stacking domain wall in bilayer graphene is one type of topological defects that can greatly affect the electronic properties of bilayer graphene and therefore lead to nontrivial transport behaviors. An outstanding question on the layer stacking domain wall is how the electrons hop between two adjacent stacking domains. Here we report the first experimental observation of electronic transport across bilayer graphene domain walls by combining near-field infrared nanoscopy and scanning voltage microscopy techniques. We observe markedly different electron transport behaviors across the tensile- and shear-type domain walls. The tensile-type domain wall is highly reflective of low-energy incident electrons, but becomes more transparent when the electron density and the Fermi energy are increased by electrostatic gating. In contrast, the shear-type domain wall is always highly transparent at different gate voltages. Such soliton-dependent electronic transport can open up new routes to engineer novel nanoelectronic devices based on layer-stacking domain walls in bilayer graphene.