• 文献标题:   Metal-to-Multilayer-Graphene Contact-Part I: Contact Resistance Modeling
  • 文献类型:   Article
  • 作  者:   KHATAMI Y, LI H, XU C, BANERJEE K
  • 作者关键词:   contact resistance, edge contact, multilayer graphene mlg, top contact, 1d contact model
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383 EI 1557-9646
  • 通讯作者地址:   Univ Calif Santa Barbara
  • 被引频次:   38
  • DOI:   10.1109/TED.2012.2205256
  • 出版年:   2012

▎ 摘  要

Parasitic components are becoming increasingly important with geometric scaling in nanoscale electronic devices and interconnects. The parasitic contact resistance between metal electrodes and multilayer graphene (MLG) is a key factor determining the performance ofMLG-based structures in various applications. The available methods for characterizing metal-MLG contact interfaces rely on a model based on the top-contact structure, but it ignores the edge contacts that can greatly reduce the contact resistance. Therefore, in the present work, a rigorous theoretical 1-D model for metal-MLG contact is developed for the first time. The contribution of the major components of resistance-the top and edge contacts (side and end contacts) and the MLG sheet resistivity-to the total resistance of the structure is included in the model. The 1-D model is compared to a 3-D model of the system, and a method for investigation and optimization of the range of validity of the 1-D model is developed. The results of this work provide valuable insight to both the characterization and design of metal-MLG contacts.