• 文献标题:   Improved performance of graphene by effectively removing surface poly-methyl methacrylate residual during the process of wet-etching transfer
  • 文献类型:   Article
  • 作  者:   YANG LQ, CHEN ZF, FENG W, WEI MJ, CHEN G, ZHENG YQ, WANG ZX, ZHANG JH, WEI B
  • 作者关键词:   cvd graphene, pmma residual, ultraviolet irradiation, organic photovoltaic
  • 出版物名称:   MOLECULAR CRYSTALS LIQUID CRYSTALS
  • ISSN:   1542-1406 EI 1563-5287
  • 通讯作者地址:   Shanghai Univ
  • 被引频次:   1
  • DOI:   10.1080/15421406.2016.1277323
  • 出版年:   2017

▎ 摘  要

Ultraviolet (UV) treatment has been demonstrated to be an effective way to removing the poly-methyl methacrylate (PMMA) residual during the process of the wet-etching transfer of graphene. The UV/Ozone irradiation with appropriate time can effectively remove the PMMA residual, resulting in a performance improvement of graphene, including the surface morphology, carrier concentration, and sheet resistance. The work function of graphene could be tuned according to treatment time without loss to the transmittance of graphene. Furthermore, we have fabricated graphene-based OPVs with a power conversion efficiency of 3.33%, which increased by 18.7% compared to the OPV without graphene modification.