• 文献标题:   Atomic Hole Doping of Graphene
  • 文献类型:   Article
  • 作  者:   GIERZ I, RIEDL C, STARKE U, AST CR, KERN K
  • 作者关键词:  
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Max Planck Inst Festkorperforsch
  • 被引频次:   319
  • DOI:   10.1021/nl802996s
  • 出版年:   2008

▎ 摘  要

The application of graphene in nanoscale electronic devices requires the deliberate control of the density and character of its charge carriers. We show by angle-resolved photoemission spectroscopy that substantial hole doping in the conical band structure of epitaxial graphene monolayers can be achieved by the adsorption of bismuth, antimony, or gold. In the case of gold doping the Dirac point is shifted into the unoccupied states. Atomic doping presents excellent perspectives for large scale production.