• 文献标题:   Enhanced Photogating Effect in Graphene Photodetectors via Potential Fluctuation Engineering
  • 文献类型:   Article
  • 作  者:   JIANG H, WEI JX, SUN FY, NIE CB, FU JT, SHI HF, SUN JX, WEI XZ, QIU CW
  • 作者关键词:   photogating effect, graphene, infrared photodetector, potential fluctuation engineering, silicon grating
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:  
  • 被引频次:   25
  • DOI:   10.1021/acsnano.1c10795
  • 出版年:   2022

▎ 摘  要

The photogating effect in hybrid structures has manifested itself as a reliable and promising approach for photodetectors with ultrahigh responsivity. A crucial factor of the photogating effect is the built-in potential at the interface, which controls the separation and harvesting of photogenerated carriers. So far, the primary efforts of designing the built-in potential rely on discovering different materials and developing multilayer structures, which may raise problems in the compatibility with the standard semiconductor production line. Here, we report an enhanced photogating effect in a monolayer graphene photodetector based on a structured substrate, where the built-in potential is established by the mechanism of potential fluctuation engineering. We find that the enhancement factor of device responsivity is related to a newly defined parameter, namely, fluctuation period rate (P-f). Compared to the device without a nanostructured substrate, the responsivity of the device with an optimized P-f is enhanced by 100 times, reaching a responsivity of 240 A/W and a specific detectivity, D*, of 3.4 x 10(12) Jones at 1550 nm wavelength and room temperature. Our experimental results are supported by both theoretical analysis and numerical simulation. Since our demonstration of the graphene photodetectors leverages the engineering of structures with monolayer graphene rather than materials with a multilayer complex structure. it should be universal and applicable to other hybrid photodetectors.