• 文献标题:   Application of Graphene to Photosensitive Diazo/PVA Resist
  • 文献类型:   Article
  • 作  者:   HARADA K, OKADA M, HIAKI T, MATSUDA K, TAKAHARA S, HOSHINO K, SUGITA K
  • 作者关键词:   photosensitive diazo compound, graphene, conductivity, hardnes
  • 出版物名称:   JOURNAL OF PHOTOPOLYMER SCIENCE TECHNOLOGY
  • ISSN:   0914-9244
  • 通讯作者地址:   Nihon Univ
  • 被引频次:   0
  • DOI:   10.2494/photopolymer.25.439
  • 出版年:   2012

▎ 摘  要

One of the nanocarbons, graphene, was added to a Diphenylamine-4-diazoniuin sulfate/formaldehyde condensate/polyvinyl alcohol (DSR/PVA) resist films. Conductivity of the DSR/PVA cured films was increased by the incorporation of graphene. The Conductivity was larger than that with multi-walled carbon nanotube (CNT) and fulleren C-60 (weight ratio of graphene, CNT or C-60 to DSR = 1.00 : 1.00). The conductivity of the DSR/PVA films with graphene depended on the dispersion method. The values of electric conductivity (sigma) for the thin cured films (3 mu m) were ca. 1.5 times larger than those for the thick films (4 mu m). Photodecomposition of DSR/PVA coated films with graphene was accelerated. It is considered that diazocompounds were reductively decomposed by the electrons evolved from graphene which absorbed light energy. Electron rich characteristics of graphene may play an important role in enhancing of electric conductivity and photo decomposition rate. Hardness of the DSR/PVA cured films with graphene was higher than that without additives. Conductivity and hardness of the DSR/PVA cured films containing graphene is higher than those with long CNT and round C-60 which seems to be due to more polarity edge parts of graphene.