• 文献标题:   Mechanical response of few-layer graphene films on copper foils
  • 文献类型:   Article
  • 作  者:   MOGHAL J, WU YMA, WARNER JH
  • 作者关键词:   fewlayer graphene, grain boundarie, scratch test, scanning electron microscopy sem
  • 出版物名称:   SCRIPTA MATERIALIA
  • ISSN:   1359-6462
  • 通讯作者地址:   Univ Oxford
  • 被引频次:   4
  • DOI:   10.1016/j.scriptamat.2012.04.041
  • 出版年:   2012

▎ 摘  要

Few-layer graphene (FLG) continuous films were synthesized on copper foils using atmospheric pressure chemical vapour deposition and their mechanical behaviour is examined using nanoscratch tests. This study investigates how the FLG films respond to a range of applied loads. The FLG films are polycrystalline with 2 micron domains, which fragment upon nanoscratching. Using nanoscratch tests, it is possible to gauge an understanding of the interaction of the FLG with the varying copper grain boundaries across the copper foil. (C) 2012 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.