• 文献标题:   The evolution of Raman spectrum of graphene with the thickness of SiO2 capping layer on Si substrate
  • 文献类型:   Article
  • 作  者:   LIU C, MA YG, LI WS, DAI L
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Peking Univ
  • 被引频次:   15
  • DOI:   10.1063/1.4832063
  • 出版年:   2013

▎ 摘  要

In this paper, we have systematically studied the evolution of Raman spectrum of graphene with the thickness of SiO2 capping layer on Si substrate. We find that, for both monolayer and bilayer graphenes, the intensities of D, G, and 2D bands, together with the intensity ratio of 2D to G Raman bands (I-2D/I-G), oscillate quasi-periodically with SiO2 thickness increasing. The origin of the observed phenomena is theoretically analyzed. Our result shows that one must pay enough attention to the SiO2 thickness when using the Raman footprints, especially the commonly used I-2D/I-G, to identify the graphene layers transferred onto SiO2/Si substrate. (C) 2013 AIP Publishing LLC.