▎ 摘　　要

Graphene is a well-known material with various potential applications. Here we report the manufacture of high-quality and large-scale monolayer graphene pasters via polyvinyl butyral (PVB). These pasters have good self-supporting properties and overcome the drawback of weak mechanical strength of PMMA. Manual manipulations to monolayer graphene become realizable via graphene pasters. Graphene pasters can be quickly diverted onto any substrate with sufficient contact and greatly minimize the challenges in graphene transfer, measurements, and other applications. The improved transfer process via graphene pasters protects the integrity of monolayer graphene and introduces few cracks or tears into graphene. Large-scale monolayer graphene films diverted onto SiO2/Si by using graphene pasters maintain low resistivity and low Dirac point, while also exhibiting a higher magnetoresistance than traditional results. High magnetoresistance up to 600% and signs of saturation at high magnetic fields can be seen. Obvious negative magnetoresistance at low magnetic fields due to weak localization also can be observed. Graphene pasters can be used in many different domains and will promote future studies and applications of graphene.