▎ 摘　　要

Stable ultrathin transparent conductive graphene micropatterns were fabricated from photosensitive polymer diazoresin (DR) and graphene oxide (GO) using a layer by layer (LBL) self-assembly technique. The GO micropatterns were realized on LBL ultrathin film after UV exposure through a photomask. After in situ reduction of the GO patterns using hydrazine hydrate, transparent conductive graphene micropatterns were obtained. The graphene patterns were characterized systemically with scanning electron microscopy, atomic force microscopy, UV-Vis spectroscopy and four-point conductivity measurement system. All of the results indicate that the combined LBL self-assembly and photolithography technique is a promising method for constructing stable transparent conductive graphene micropatterns with nanoscale thickness. The obtained graphene micropatterns may have potential applications in making transparent circuits and sensors.