• 文献标题:   An Extraction Method for Mobility Degradation and Contact Resistance of Graphene Transistors
  • 文献类型:   Article
  • 作  者:   PACHECOSANCHEZ A, MAVREDAKIS N, FEIJOO PC, JIMENEZ D
  • 作者关键词:   degradation, logic gate, resistance, graphene, contact resistance, adaptation model, transconductance, channel resistance, contact resistance, graphene fieldeffect transistor fet, mobility degradation, y function
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383 EI 1557-9646
  • 通讯作者地址:  
  • 被引频次:   1
  • DOI:   10.1109/TED.2022.3176830 EA MAY 2022
  • 出版年:   2022

▎ 摘  要

The intrinsic mobility degradation coefficient, contact resistance, and the transconductance parameter of graphene field-effect transistors (GFETs) are extracted for different technologies by considering a novel transport model embracing mobility degradation effects within the charge channel control description. By considering the mobility degradation-based model, a straightforward extraction methodology, not provided before, is enabled by applying the concept of the well-known Y-function to the I-V device characteristics. The method works regardless of the gate device architecture. An accurate description of experimental data of fabricated devices is achievedwith the underlying transport equation by using the extracted parameters. An evaluation of the channel resistance, enabled by the extracted parameters here, has also been provided.