• 文献标题:   Review of photoreduction and synchronous patterning of graphene oxide toward advanced applications
  • 文献类型:   Review
  • 作  者:   JIANG HB, ZHAO B, LIU Y, LI SY, LIU J, SONG YY, WANG DD, XIN W, REN LQ
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF MATERIALS SCIENCE
  • ISSN:   0022-2461 EI 1573-4803
  • 通讯作者地址:   Jilin Univ
  • 被引频次:   3
  • DOI:   10.1007/s10853-019-03981-z
  • 出版年:   2020

▎ 摘  要

In view of the bulk production, resolvability, dispersibility of aqueous solution, graphene oxides (GO) prepared by strong chemical oxidation of graphite flakes have been widely used for the production of graphene-like materials. However, because of the insulating nature caused by amounts of defects on its surface, the application of GO material is greatly constrained. Hence, effective reduction of GO becomes critical. The photoreduction of GO showed more attractive properties than conventional thermal/chemical routes due to its synchronous reduction and flexible patterning, which facilitates a number of applications, such as the electrochemical energy storage devices, electronic devices, and biomimetic substrates. In this review, we dedicatedly summarized the latest advances in photoreduction including the fabrications and applied values in multiple fields. We deem that the photoreduction and synchronous patterning of GO will have very prospects in the development of graphene devices.