• 文献标题:   Controlling the self-doping of epitaxial graphene on SiC via Ar ion treatment
  • 文献类型:   Article
  • 作  者:   JEE HG, JIN KH, HAN JH, HWANG HN, JHI SH, KIM YD, HWANG CC
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   1098-0121
  • 通讯作者地址:   POSTECH
  • 被引频次:   16
  • DOI:   10.1103/PhysRevB.84.075457
  • 出版年:   2011

▎ 摘  要

We present a simple but efficient way to control substrate-induced doping of graphene via mechanical deformations induced by Ar ions. Graphene on SiC is n-doped because of the substrate-to-graphene charge transfer. Using angle-resolved photoemission spectroscopy (ARPES), core level shift, and scanning tunneling microscopy (STM), the treatment with 0.5-keV Ar ions was found to reduce the charge transfer. First-principles calculations suggest that Stone-Wales defects among various defect structures are likely responsible for the change in the substrate-graphene charge transfer.