• 文献标题:   Impact of kinetics on the growth of GaN on graphene by plasma-assisted molecular beam epitaxy
  • 文献类型:   Article
  • 作  者:   GRUART M, FELDBERG N, GAYRAL B, BOUGEROL C, POUGET S, BELLETAMALRIC E, GARRO N, CROS A, OKUNO H, DAUDIN B
  • 作者关键词:   gan, graphene, plasma assisted molecular beam epitaxy, van der waals epitaxy
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   Univ Grenoble Alpes
  • 被引频次:   1
  • DOI:   10.1088/1361-6528/ab5c15
  • 出版年:   2020

▎ 摘  要

The growth of GaN on graphene by molecular beam epitaxy was investigated. The most stable epitaxial relationship, i.e. [00.1]-oriented grains, is obtained at high temperature and N-rich conditions, which match those for nanowire growth. Alternatively, at moderate temperature and Ga-rich conditions, several metastable orientations are observed at the nucleation stage, which evolve preferentially towards [00.1]-oriented grains. The dependence of the nucleation regime on growth conditions was assigned to Ga adatom kinetics. This statement is consistent with the calculated graphene/GaN in-plane lattice coincidence and supported by a combination of transmission electron microscopy, x-ray diffraction, photoluminescence, and Raman spectroscopy experiments.