• 文献标题:   Dipole-Engineering Strategy for Regulating the Electronic Contact of a Two-Dimensional SbX/Graphene (X = P, As, Bi) van der Waals Interface
  • 文献类型:   Article
  • 作  者:   LI J, LIU WQ, ZHOU WH, YANG JL, QU HZ, HU Y, ZHANG SL
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW APPLIED
  • ISSN:   2331-7019
  • 通讯作者地址:  
  • 被引频次:   11
  • DOI:   10.1103/PhysRevApplied.17.054009
  • 出版年:   2022

▎ 摘  要

A Schottky barrier, formed in the contact of a two-dimensional (2D) semiconductor and metal electrode, seriously degrades device performance. Herein, we propose a dipole-engineering strategy to regulate the electronic contact properties of a 2D polar SbX (X = P, As, Bi) and graphene (Gr) van der Waals interface. Owing to the mirror asymmetry of SbX, we construct seven vertical heterostructures in the form of X Sb-Gr and SbX-Gr. Tunable Schottky barrier height and contact type can be obtained by using different atomic terminals to contact with Gr. Based on the first-principles calculations, the dipole and its associated potential step are found to be responsible for the regulating effect. Moreover, owing to the remarkable properties of the SbBi-Gr heterostructure, such as Ohmic contact and low tunneling barrier, we design an optoelectronic field-effect transistor, which exhibits considerable responsivity (0.089 AW(-1)) and external quantum efficiency (28.57%). Our findings further confirm that regulating the electronic contact properties by the dipole in the heterostructure is a feasible strategy, which provides meaningful guidance for designing high-performance electronic and optoelectronic devices.