• 文献标题:   Bilayer Graphene Tunneling FET for Sub-0.2 V Digital CMOS Logic Applications
  • 文献类型:   Article
  • 作  者:   AGARWAL TK, NOURBAKHSH A, RAGHAVAN P, RADU I, DE GENDT S, HEYNS M, VERHELST M, THEAN A
  • 作者关键词:   bilayer graphene, tfet, contact induced doping, digital cmos logic
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106 EI 1558-0563
  • 通讯作者地址:   Katholieke Univ Leuven
  • 被引频次:   5
  • DOI:   10.1109/LED.2014.2364260
  • 出版年:   2014

▎ 摘  要

We propose a bilayer graphene (BLG) tunneling field-effect-transistor (TFET) suitable for digital CMOS logic circuits. The ultimate performance limit of this structure is evaluated by solving the quantum transport equations in nonequilibrium Green's function framework. A bandgap opening is induced in BLG using both vertical electric field and top-bottom asymmetric chemical doping. To overcome the limitations of nonabrupt p-i-n junctions using practical process methods, source/drain regions are created using work-function engineered metal-graphene contacts. We evaluate the performance of BLG-TFET by taking doping gradient due to contact induced doping into account. Our BLG-TFET exhibits a subthreshold slope as low as 35 mV/dec, and I-ON/I-OFF as high as 2910 for a supply voltage of 0.2 V. The proposed BLG-TFET shows promise for ultralow-power applications, particularly in low to medium speed applications.