• 文献标题:   Study the impact of graphene channel over conventional silicon on DC/analog and RF performance of DG dual-material-gate VTFET
  • 文献类型:   Article
  • 作  者:   ZOHMINGLIANA, CHOUDHURI B, BHOWMICK B
  • 作者关键词:   analog, btbt, cutoff frequency, graphene, mosfet, transconductance, rf, vtfet
  • 出版物名称:   MICROELECTRONICS JOURNAL
  • ISSN:   0026-2692 EI 1879-2391
  • 通讯作者地址:  
  • 被引频次:   3
  • DOI:   10.1016/j.mejo.2022.105581 EA SEP 2022
  • 出版年:   2022

▎ 摘  要

In this article, using a Silvaco TCAD simulator, the impact of Graphene Channel Double Gate Dual Gate Material Vertical tunnel FET on the analog and RF application is studied. We observed better results in DC characteristics such as drain current (ION), leakage current (IOFF), subthreshold swing (SS), DIBL as well as On current Off current ratio (ION/IOFF). Graphene Vertical tunnel FET proves that the structure is a magnificent candidate for analog and high-frequency range applications. The important figures of merit (FOMs) illustrated in this article are analog performance such as transconductance (gm), second-order transconductance (gg2), output conductance (gd), and VIP2. Due to the dual effect of the high mobility/ controllable band gap of graphene channel and band-to-band tunnel, the proposed structure greatly impacts the result.