• 文献标题:   Reactive-ion-etched graphene nanoribbons on a hexagonal boron nitride substrate
  • 文献类型:   Article
  • 作  者:   BISCHOFF D, KRAHENMANN T, DROSCHER S, GRUNER MA, BARRAUD C, IHN T, ENSSLIN K
  • 作者关键词:   boron compound, carrier mobility, graphene, nanoribbon, sputter etching, substrate
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   ETH
  • 被引频次:   32
  • DOI:   10.1063/1.4765345
  • 出版年:   2012

▎ 摘  要

We report on the fabrication and electrical characterization of both single layer graphene micron-sized devices and nanoribbons on a hexagonal boron nitride substrate. We show that the micron-sized devices have significantly higher mobility and lower disorder density compared to devices fabricated on silicon dioxide substrate in agreement with previous findings. The transport characteristics of the reactive-ion-etched graphene nanoribbons on hexagonal boron nitride, however, appear to be very similar to those of ribbons on a silicon dioxide substrate. We perform a detailed study in order to highlight both similarities as well as differences. Our findings suggest that the edges have an important influence on transport in reactive-ion-etched graphene nanodevices. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4765345]