• 文献标题:   Highly oriented, free-standing, superconducting NbN films growth on chemical vapor deposited graphene
  • 文献类型:   Article
  • 作  者:   SARASWAT G, GUPTA P, BHATTACHARYA A, RAYCHAUDHURI P
  • 作者关键词:  
  • 出版物名称:   APL MATERIALS
  • ISSN:   2166-532X
  • 通讯作者地址:   Tata Inst Fundamental Res
  • 被引频次:   10
  • DOI:   10.1063/1.4875356
  • 出版年:   2014

▎ 摘  要

NbN films are grown on chemical vapor deposited graphene using dc magnetron sputtering. The orientation and transition temperature of the deposited films is studied as a function of substrate temperature. A superconducting transition temperature of 14 K is obtained for highly oriented (111) films grown at substrate temperature of 150 degrees C, which is comparable to epitaxial films grown on MgO and sapphire substrates. These films show a considerably high upper critical field of similar to 33 T. In addition, we demonstrate a process for obtaining flexible, free-standing NbN films by delaminating graphene from the substrate using a simple wet etching technique. These free-standing NbN layers can be transferred to any substrate, potentially enabling a range of novel superconducting thin-film applications. (C) 2014 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.