• 文献标题:   Analysis of the carrier transport mechanism and barrier height formation of graphene/Zr-ZnO Schottky contact by I-V-T
  • 文献类型:   Article
  • 作  者:   LI YP, LI YF, ZHANG JH
  • 作者关键词:   zrzno film, graphene, schottky contact, solgel method, carrier transport mechanism, ivt
  • 出版物名称:   MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
  • ISSN:   1369-8001 EI 1873-4081
  • 通讯作者地址:   Shaanxi Univ Technol
  • 被引频次:   1
  • DOI:   10.1016/j.mssp.2019.104793
  • 出版年:   2020

▎ 摘  要

The graphene/Zr-ZnO Schottky contacts were prepared by sol-gel method, and the electrical properties of Schottky contact were analyzed by thermionic emission model. The results showed the oxygen vacancies in ZnO films decrease due to Zr ion doping. Meanwhile, the leakage current of graphene/Zr-ZnO Schottky contact reduces and barrier height increases, which is mainly related to the reduction of defect levels at the interface owing to Zr ion doping. By the I-V-T measurement, the result showed that the barrier height increases and the ideal factor decreases with the raising of temperature from 160 K to 300 K, which can be explained by the lateral inhomogeneities of barrier height that was confirmed with gauss distribution function.