• 文献标题:   Thermal boundary resistance between the polycrystalline graphene and the amorphous SiO2 substrate
  • 文献类型:   Article
  • 作  者:   LI T, TANG ZA, HUANG ZX, YU J
  • 作者关键词:   graphene, silicon dioxide, thermal boundary resistance, grain boundarie, molecular dynamic
  • 出版物名称:   CHEMICAL PHYSICS LETTERS
  • ISSN:   0009-2614 EI 1873-4448
  • 通讯作者地址:   Dalian Univ Technol
  • 被引频次:   4
  • DOI:   10.1016/j.cplett.2017.07.047
  • 出版年:   2017

▎ 摘  要

The interface between graphene and substrate plays a very important role in graphene-based advanced devices. We examine the thermal boundary resistance R of the graphene/silicon dioxide (Gr/SiO2) interface by using molecular dynamics simulations. R decreases monotonically with the increase of temperature and exhibits a strong dependence on the substrate coupling strength. Due to the polycrystalline nature of graphene, we show that the presence of periodic 5-7, 5-8-5 and 5-7-5-7 grain boundaries in graphene enhances phonon transmission across the Gr/SiO2 interface, which are attributed to both the increased overlap in the phonon spectra and more inelastic scattering at the interface. (C) 2017 Elsevier B.V. All rights reserved.