• 文献标题:   Thermal stability of a Schottky diode fabricated with transfer-free deposition of multilayer graphene on n-GaN by solid-phase reactions
  • 文献类型:   Article
  • 作  者:   UDDIN MS, UENO K
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922 EI 1347-4065
  • 通讯作者地址:   Shibaura Inst Technol
  • 被引频次:   0
  • DOI:   10.7567/JJAP.56.07KD05
  • 出版年:   2017

▎ 摘  要

Multilayer graphene (MLG)/n-GaN Schottky diodes were fabricated by transfer-free deposition of MLG on n-GaN by solid-phase reactions with cobalt as a catalyst. The thermal stability of the diodes was determined from the current-voltage (I-V) characteristics after annealing the diodes in vacuum at 200-500 degrees C, at intervals of 100 degrees C. The diode characteristics evaluated using a thermionic emission model and Cheung's function using I-V data revealed that the Schottky barrier diode (SBD) fabricated with MLG as a Schottky contact on n-GaN showed better thermal stability than the conventional Ni/n-GaN SBD. The prevention of Au diffusion to n-GaN with MLG as a diffusion barrier layer and the unaffected interface reactions between n-GaN and MLG are possible reasons for the improved thermal stability, enabling potential application of this new diode in highpower and high-temperature operations. (C) 2017 The Japan Society of Applied Physics