• 文献标题:   High-Gain Graphene Transistors with a Thin AlOx Top-Gate Oxide
  • 文献类型:   Article
  • 作  者:   GUERRIERO E, PEDRINAZZI P, MANSOURI A, HABIBPOUR O, WINTERS M, RORSMAN N, BEHNAM A, CARRION EA, PESQUERA A, CENTENO A, ZURUTUZA A, POP E, ZIRATH H, SORDAN R
  • 作者关键词:  
  • 出版物名称:   SCIENTIFIC REPORTS
  • ISSN:   2045-2322
  • 通讯作者地址:   Politecn Milan
  • 被引频次:   12
  • DOI:   10.1038/s41598-017-02541-2
  • 出版年:   2017

▎ 摘  要

The high-frequency performance of transistors is usually assessed by speed and gain figures of merit, such as the maximum oscillation frequency f(max), cutoff frequency f(T), ratio f(max)/f(T), forward transmission coefficient S-21, and open-circuit voltage gain A(v). All these figures of merit must be as large as possible for transistors to be useful in practical electronics applications. Here we demonstrate high-performance graphene field-effect transistors (GFETs) with a thin AlOx gate dielectric which outperform previous state-of-the-art GFETs: we obtained f(max)/f(T) > 3, A(v) > 30 dB, and S-21 = 12.5 dB (at 10 MHz and depending on the transistor geometry) from S-parameter measurements. A dc characterization of GFETs in ambient conditions reveals good current saturation and relatively large transconductance similar to 600 S/m. The realized GFETs offer the prospect of using graphene in a much wider range of electronic applications which require substantial gain.