• 文献标题:   Computer Simulation of the Thermal Stability of Nickel Films on Two-Layer Graphene
  • 文献类型:   Article
  • 作  者:   GALASHEV AE
  • 作者关键词:  
  • 出版物名称:   HIGH TEMPERATURE
  • ISSN:   0018-151X EI 1608-3156
  • 通讯作者地址:   Russian Acad Sci
  • 被引频次:   7
  • DOI:   10.1134/S0018151X1405006X
  • 出版年:   2014

▎ 摘  要

The structure and the dynamic and mechanical properties of monolayer nickel films deposited on two-layer graphene are studied in the temperature range 300 < T < 3300 K by the molecular-dynamics method. A part of the Ni atoms remains on the graphene sheet even at T = 3300 K for both one-and two-sided coatings. The radial distribution functions of the upper and lower metal films differ significantly even at T = 300 K. The temperature dependence of the horizontal and vertical components of the self-diffusion coefficient of a one-sided nickel film exhibits a jump above 1800 K. No similar specific feature was observed for a two-sided coating of graphene with this film. The stress components acting in the nickel-film plane disappear with an increase in temperature for a shorter time in the case of one-sided coating.