• 文献标题:   Controlled n-doping in chemical vapour deposition grown graphene by antimony
  • 文献类型:   Article
  • 作  者:   KHALIL HMW, NAM JT, KIM KS, NOH H
  • 作者关键词:   graphene, doping, antimony
  • 出版物名称:   JOURNAL OF PHYSICS DAPPLIED PHYSICS
  • ISSN:   0022-3727 EI 1361-6463
  • 通讯作者地址:   Sejong Univ
  • 被引频次:   2
  • DOI:   10.1088/0022-3727/48/1/015307
  • 出版年:   2015

▎ 摘  要

We have studied the effects of antimony (Sb) doping on graphene grown by chemical vapour deposition without any significant change in its electrical properties. By increasing the metal thickness from 1 to 5 nm, we found a shift in the wave numbers of Raman G and two-dimensional (2D) peaks consistent with n-doping and a change in the Fermi level of the graphene into the conduction band. The relative intensity of the D peak to the G peak did not show a significant change and that of the 2D peak to the G peak remained at a large enough number as a function of metal thickness, implying little degradation by the metal dopants. Transport measurements also confirm the n-doping of graphene through a shift of Dirac point in the transfer characteristics and the quality preservation with little changes in mobility. We also report on the formation of a p-n junction by metal doping on selected areas of the graphene and their electrical properties with transfer characteristics and Hall measurements.