• 文献标题:   Local strain in tunneling transistors based on graphene nanoribbons
  • 文献类型:   Article
  • 作  者:   LU Y, GUO J
  • 作者关键词:   field effect transistor, graphene, nanostructured material, phonon, tunnelling
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Florida
  • 被引频次:   18
  • DOI:   10.1063/1.3479915
  • 出版年:   2010

▎ 摘  要

A band-to-band tunneling field-effect transistor (FET) can achieve a subthreshold slope steeper than 60 mV/dec at room temperature, but the on-current is low due to existence of the tunneling barrier. Graphene has a monolayer-thin body which is amenable to strain. By using self-consistent quantum transport simulations, we show that with local strain applied at the tunneling junction between the source and the channel in a graphene nanoribbon tunneling FET, the on-current can be significantly improved by over a factor of 10 with the same off-current, no matter at the ballistic limit or in the presence of inelastic phonon scattering. (C) 2010 American Institute of Physics. [doi:10.1063/1.3479915]