• 文献标题:   Shear Modulus of Monolayer Graphene Prepared by Chemical Vapor Deposition
  • 文献类型:   Article
  • 作  者:   LIU X, METCALF TH, ROBINSON JT, HOUSTON BH, SCARPA F
  • 作者关键词:   graphene, shear modulu, internal friction, chemical vapor deposition, carbon, nanomechanic
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   USN
  • 被引频次:   74
  • DOI:   10.1021/nl204196v
  • 出版年:   2012

▎ 摘  要

We report shear modulus (G) and internal friction (Q(-1)) measurements of large-area monolayer graphene films grown by chemical vapor deposition on copper foil and transferred onto high-Q silicon mechanical oscillators. The shear modulus, extracted from a resonance frequency shift at 0.4 K where the apparatus is most sensitive, averages 280 GPa. This is five times larger than those of the multilayered graphene-based films measured previously. The internal friction is unmeasurable within the sensitivity of our experiment and thus bounded above by Q(-1)