• 文献标题:   Ultraclean Patterned Transfer of Single-Layer Graphene by Recyclable Pressure Sensitive Adhesive Films
  • 文献类型:   Article
  • 作  者:   KIM SJ, CHOI T, LEE B, LEE S, CHOI K, PARK JB, YOO JM, CHOI YS, RYU J, KIM P, HONE J, HONG BH
  • 作者关键词:   clean transfer, supporting polymer recycle, graphene patterning, surface wetting adhesion energy
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Columbia Univ
  • 被引频次:   53
  • DOI:   10.1021/acs.nanolett.5b00440
  • 出版年:   2015

▎ 摘  要

We report an ultraclean, cost-effective, and easily scalable method of transferring and patterning large-area graphene using pressure sensitive adhesive films (PSAFs) at room temperature. This simple transfer is enabled by the difference in wettability and adhesion energy of graphene with respect to PSAF and a target substrate. The PSAF-transferred graphene is found to be free from residues and shows excellent charge carrier mobility as high as similar to 17-700 cm(2)/V(.)s with less doping compared to the graphene transferred by thermal release tape (TRT) or poly(methyl methacrylate) (PMMA) as well as good uniformity over large areas. In addition, the sheet resistance of graphene transferred by recycled PSAF does not change considerably up to 4 times, which would be advantageous for more cost-effective and environmentally friendly production of large-area graphene films for practical applications.