• 文献标题:   Aryl Functionalization as a Route to Band Gap Engineering in Single Layer Graphene Devices
  • 文献类型:   Article
  • 作  者:   ZHANG H, BEKYAROVA E, HUANG JW, ZHAO Z, BAO WZ, WANG FL, HADDON RC, LAU CN
  • 作者关键词:   graphene, aryl group grafting, functonalization, band gap engineering, variable range hopping
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Univ Calif Riverside
  • 被引频次:   106
  • DOI:   10.1021/nl200803q
  • 出版年:   2011

▎ 摘  要

Chemical functionalization is a promising route to band gap engineering of graphene. We chemically grafted nitrophenyl groups onto exfoliated single-layer graphene sheets in the form of substrate-supported or free-standing films. Our transport measurements demonstrate that nonsuspended functionalized graphene behaves as a granular metal, with variable range hopping transport and a mobility gap similar to 0.1 eV at low temperature. For suspended graphene that allows functionaliza-tion on both surfaces, we demonstrate tuning of its electronic properties from a granular metal to a semiconductor in which transport occurs via thermal activation over a transport gap similar to 80 meV from 4 to 300 K. This noninvasive and scalable functionalization technique paves the way for CMOS-compatible band gap engineering of graphene electronic devices.