• 文献标题:   Graphene Patterning and Lithography Employing Laser/Electron-Beam Reduced Graphene Oxide and Hydrogenated Graphene
  • 文献类型:   Article
  • 作  者:   KUMAR P, SUBRAHMANYAM KS, RAO CNR
  • 作者关键词:   graphene, graphene oxide, hydrogenated graphene, micropatterning, nanolithography
  • 出版物名称:   MATERIALS EXPRESS
  • ISSN:   2158-5849 EI 2158-5857
  • 通讯作者地址:   Jawaharlal Nehru Ctr Adv Sci Res
  • 被引频次:   45
  • DOI:   10.1166/mex.2011.1024
  • 出版年:   2011

▎ 摘  要

Having discovered that graphene oxide (GO) films get reduced to graphene when subjected to laser or electron beam irradiation, we have carried out graphene patterning and nanolithography starting with pure GO and GO mixture with gold and platinum salts. Patterning has also been carried out with hydrogenated graphene which upon laser irradiation reverts back to graphene giving out hydrogen.