• 文献标题:   van der Waals Screening by Single-Layer Graphene and Molybdenum Disulfide
  • 文献类型:   Article
  • 作  者:   TSOI S, DEV P, FRIEDMAN AL, STINE R, ROBINSON JT, REINECKE TL, SHEEHAN PE
  • 作者关键词:   graphene, van der waals interaction, screening, atomic force microscopy
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   US Naval Res Lab
  • 被引频次:   34
  • DOI:   10.1021/nn5050905
  • 出版年:   2014

▎ 摘  要

A sharp tip of atomic force microscope is employed to probe van der Waals forces of a silicon oxide substrate with adhered graphene. Experimental results obtained in the range of distances from 3 to 20 nm indicate that single-, double-,and triple-layer graphenes screen the van der Waals forces of the substrate. Fluorination of graphene, which makes it electrically insulating, lifts the screening in the single-layer graphene. The van der Waals force from graphene determined per layer decreases with the number of layers. In addition, increased hole doping of graphene increases the force. Finally, we also demonstrate screening of the van der Waals forces of the silicon oxide substrate by single- and double-layer molybdenum disulfide.