• 文献标题:   Imaging Bulk and Edge Transport near the Dirac Point in Graphene Moire Superlattices
  • 文献类型:   Article
  • 作  者:   DOU ZW, MORIKAWA S, CRESTI A, WANG SW, SMITH CG, MELIOS C, KAZAKOVA O, WATANABE K, TANIGUCHI T, MASUBUCHI S, MACHIDA T, CONNOLLY MR
  • 作者关键词:   graphene moire superlattice, gapped dirac fermion system, scanning gate microscopy, topological edge state, valley hall effect
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Univ Cambridge
  • 被引频次:   5
  • DOI:   10.1021/acs.nanolett.8b00228
  • 出版年:   2018

▎ 摘  要

Van der Waals structures formed by aligning monolayer graphene with insulating layers of hexagonal boron nitride exhibit a moire superlattice that is expected to break sublattice symmetry. Despite an energy gap of several tens of millielectronvolts opening in the Dirac spectrum, electrical resistivity remains lower than expected at low temperature and varies between devices. While subgap states are likely to play a role in this behavior, their precise nature is unclear. We present a scanning gate microscopy study of moire superlattice devices with comparable activation energy but with different charge disorder levels. In the device with higher charge impurity (similar to 10(10) cm(-2)) and lower resistivity (similar to 10 K Omega) at the Dirac point we observe current flow along the graphene edges. Combined with simulations, our measurements suggest that enhanced edge doping is responsible for this effect. In addition, a device with low charge impurity (similar to 10(9) cm(-2)) and higher resistivity (similar to 100 K Omega) shows subgap states in the bulk, consistent with the absence of shunting by edge currents.