• 文献标题:   STM study of oxygen intercalation at the graphene/Ni(111) interface
  • 文献类型:   Article
  • 作  者:   KOVALENKO SL, ANDRYUSHECHKIN BV, ELTSOV KN
  • 作者关键词:   nickel, oxygen, graphene, scanning tunneling microscopy
  • 出版物名称:   CARBON
  • ISSN:   0008-6223 EI 1873-3891
  • 通讯作者地址:   Russian Acad Sci
  • 被引频次:   3
  • DOI:   10.1016/j.carbon.2020.03.054
  • 出版年:   2020

▎ 摘  要

This paper reports an STM study of all stages of the intercalation of oxygen at the interface of a strongly coupled graphene/Ni(111) system prepared by temperature programmed growth (TPG) method. We have found that at the first stage of the intercalation at 120 degrees C, oxygen forms a chemisorbed layer on Ni(111) with a coverage about 0.26-0.28 ML, approximately described by the compressed p(2 x 2) lattice. The second stage of the intercalation is the formation of a single NiO(100) layer visualized in STM images as a specific 'square' superstructure at the graphene/Ni(111) interface. It was also established that the rate of the oxygen intercalation at 250 degrees C is much higher than at 120 degrees C. After intercalation at 250 degrees C, STM also reveals the formation of regions with 'free-standing' graphene, associated with the presence of a double nickel oxide layer underneath. (C) 2020 Elsevier Ltd. All rights reserved.