• 文献标题:   Epitaxy of Graphene on 3C-SiC(111) Thin Films on Microfabricated Si(111) Substrates
  • 文献类型:   Article
  • 作  者:   IDE T, KAWAI Y, HANDA H, FUKIDOME H, KOTSUGI M, OHKOCHI T, ENTA Y, KINOSHITA T, YOSHIGOE A, TERAOKA Y, SUEMITSU M
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922 EI 1347-4065
  • 通讯作者地址:   Tohoku Univ
  • 被引频次:   7
  • DOI:   10.1143/JJAP.51.06FD02
  • 出版年:   2012

▎ 摘  要

The epitaxy of graphene on 3C-SiC(111) formed on microfabricated Si(111) has been demonstrated. Through observations by optical microscopy, micro-Raman spectroscopy, low-energy electron diffraction, and photoelectron spectroscopy, it has been confirmed that the epitaxial graphene is Bernal-stacked with a buffer layer present between graphene and the 3C-SiC film, which can lead to the opening of the band gap necessary for logic operations. The quality of graphene is improved by the shrinkage of the pattern. These results indicate that graphene on silicon using the microfabricated substrate is a promising material for the realization of graphene-based devices. (C) 2012 The Japan Society of Applied Physics