• 文献标题:   Charge transfer between epitaxial graphene and silicon carbide
  • 文献类型:   Article
  • 作  者:   KOPYLOV S, TZALENCHUK A, KUBATKIN S, FAL KO VI
  • 作者关键词:   charge exchange, electron density, epitaxial growth, graphene, monolayer, semiconductor doping, semiconductor epitaxial layer, silicon compound, work function
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Univ Lancaster
  • 被引频次:   113
  • DOI:   10.1063/1.3487782
  • 出版年:   2010

▎ 摘  要

We analyze doping of graphene grown on SiC in two models which differ by the source of charge transferred to graphene, namely, from SiC surface and from bulk donors. For each of the two models, we find the maximum electron density induced in monolayer and bilayer graphene, which is determined by the difference between the work function for electrons in pristine graphene and donor states on/in SiC, and analyze the responsivity of graphene to the density variation by means of electrostatic gates. (c) 2010 American Institute of Physics. [doi:10.1063/1.3487782]