▎ 摘　　要

200 nm Ni film is coated on 25 mu m thick Mo foil, and graphene is grown on the Ni-Mo system by CVD method. After the annealing process of CVD, the Ni/Mo bilayer transforms into Ni-Mo alloy, then we have successfully fabricated MgB2 films on graphene/Ni-Mo alloy system via the hybrid physical-chemical vapor deposition (HPCVD) technique. The transition temperature T-c onset is 38.25 K with a corresponding transition width of 0.75 K. The average thickness of MgB2 films is 200 nm (25% concentration B2H6). The critical current density derives from the magnetization measurement at 5 K is, j(c) (5 K, 0 T) = 9.6 +/- 106 A/cm(2). We can easily deposite MgB2 on graphene/Ni-Mo alloy system with a lower B2H6 concentration and less gas flow, which lays a good foundation for depositing MgB2 thick films. The graphene in this system is multilayer and with defects, it may act like an intermediary film for the growth of MgB2, or a carbon-doping source. (C) 2015 Elsevier B.V. All rights reserved.