• 文献标题:   Direct patterning of reduced graphene oxide/graphene oxide memristive heterostructures by electron-beam irradiation
  • 文献类型:   Article
  • 作  者:   KAPITANOVA OO, EMELIN EV, DOROFEEV SG, EVDOKIMOV PV, PANIN GN, LEE Y, LEE S
  • 作者关键词:   electron beam irradiation, reduced graphene oxide, graphene oxide, memristive heterostructure
  • 出版物名称:   JOURNAL OF MATERIALS SCIENCE TECHNOLOGY
  • ISSN:   1005-0302
  • 通讯作者地址:   Dongguk Univ Seoul
  • 被引频次:   1
  • DOI:   10.1016/j.jmst.2019.07.042
  • 出版年:   2020

▎ 摘  要

Memristive heterostructures, composed of reduced graphene oxide with different degree of reduction, were demonstrated through a simple method of 'direct electron-beam writing' on graphene oxide. Irradiation with an electron beam at various doses and accelerating voltages made it possible to define highand low-conductivity graphene-oxide areas. The electron beam-reduced graphene oxide/graphene oxide heterostructure clearly exhibited a nonlinear behavior and a well-controlled resistive switching characteristic at a low operating-voltage range (< 1 V). The proposed memristive heterostructures are promising for highly-efficient digital storage and information process as well as for analogous neuromorphic computations. (C) 2019 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.