• 文献标题:   Performance analysis of statistical samples of graphene nanoribbon tunneling transistors with line edge roughness
  • 文献类型:   Article
  • 作  者:   LUISIER M, KLIMECK G
  • 作者关键词:   energy gap, field effect transistor, fullerene device, graphene, nanoelectronic, probability, tightbinding calculation, tunnelling
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Purdue Univ
  • 被引频次:   68
  • DOI:   10.1063/1.3140505
  • 出版年:   2009

▎ 摘  要

Using a three-dimensional, atomistic quantum transport simulator based on the tight-binding method, we investigate statistical samples of single-gate graphene nanoribbon (GNR) tunneling field-effect transistors (TFETs) with different line edge roughness probabilities. We find that as the nanoribbon edges become rougher, the device OFF-current drastically increases due to a reduction of the graphene band gap and an enhancement of source-to-drain tunneling leakage through the gate potential barrier. At the same time, the ON-current remains almost constant. This leads to a deterioration of the transistor subthreshold slopes and to unacceptably low ON/OFF current ratios limiting the switching performances of GNR TFETs.