• 文献标题:   Correlation between electron-irradiation defects and applied stress in graphene: A molecular dynamics study
  • 文献类型:   Article
  • 作  者:   KIDA S, YAMAMOTO M, TADA K, KAWATA H, HIRAI Y, YASUDA M
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF VACUUM SCIENCE TECHNOLOGY A
  • ISSN:   0734-2101 EI 1520-8559
  • 通讯作者地址:   Osaka Prefecture Univ
  • 被引频次:   1
  • DOI:   10.1116/1.4928414
  • 出版年:   2015

▎ 摘  要

Molecular dynamics (MD) simulations are performed to study the correlation between electron irradiation defects and applied stress in graphene. The electron irradiation effect is introduced by the binary collision model in the MD simulation. By applying a tensile stress to graphene, the number of adatom-vacancy (AV) and Stone-Wales (SW) defects increase under electron irradiation, while the number of single-vacancy defects is not noticeably affected by the applied stress. Both the activation and formation energies of an AV defect and the activation energy of an SW defect decrease when a tensile stress is applied to graphene. Applying tensile stress also relaxes the compression stress associated with SW defect formation. These effects induced by the applied stress cause the increase in AV and SW defect formation under electron irradiation. (C) 2015 American Vacuum Society.