• 文献标题:   Microstructural defects in GaN thin films grown on chemically vapor-deposited graphene layers
  • 文献类型:   Article
  • 作  者:   YOO H, CHUNG K, PARK SI, KIM M, YI GC
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Seoul Natl Univ
  • 被引频次:   20
  • DOI:   10.1063/1.4790385
  • 出版年:   2013

▎ 摘  要

Microstructural defects in GaN thin films grown on graphene produced via chemical vapor deposition have been investigated using electron backscatter diffraction (EBSD) and transmission electron microscopy (TEM). EBSD analysis reveals the preferred orientations of the GaN films. We further examined the microstructural defects such as grain boundaries and threading dislocations present in the films using TEM. Plan-view TEM analysis showed presence of both high-and low-angle grain boundaries and the threading dislocations mostly bound to those grain boundaries. Moreover, the characteristics and behavior of the threading dislocations were also investigated using cross-section TEM analysis. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4790385]