• 文献标题:   Low-temperature growth of graphene using interfacial catalysis of molten gallium and diluted methane chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   HIYAMA T, MURAKAMI K, KUWAJIMA T, TAKEGUCHI M, FUJITA J
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS EXPRESS
  • ISSN:   1882-0778 EI 1882-0786
  • 通讯作者地址:   Univ Tsukuba
  • 被引频次:   6
  • DOI:   10.7567/APEX.8.095102
  • 出版年:   2015

▎ 摘  要

Although the formation of graphene nuclei conventionally requires high temperature of similar to 1050 degrees C in the first growth stage, the presence of the graphene nuclei allowed for low-temperature edge growth, and this peripheral area continued growing even when the temperature was reduced to 300 degrees C in the second growth stage. The graphene grown at the second stage was a single layer with fewer defects. The Raman map showed high homogeneity with a 2D/G ratio >2 over the entire contact area of molten gallium, and the hole mobility was 600 cm(2) V-1 s(-1). (C) 2015 The Japan Society of Applied Physics