• 文献标题:   Manipulating the charge transfer at CuPc/graphene interface by O-2 plasma treatments
  • 文献类型:   Article
  • 作  者:   MAO HY, HU F, YE QL, XU YF, YANG XX, LU B
  • 作者关键词:  
  • 出版物名称:   NANOSCALE
  • ISSN:   2040-3364 EI 2040-3372
  • 通讯作者地址:   Hangzhou Normal Univ
  • 被引频次:   9
  • DOI:   10.1039/c4nr02028f
  • 出版年:   2014

▎ 摘  要

The manipulation of charge transfer at CuPc/graphene interface has been demonstrated by treating pristine graphene with O-2 plasma. As revealed by in situ ultraviolet photoelectron spectroscopy measurements, a much stronger interfacial charge transfer occurs when the pristine graphene is exposed to O-2 plasma prior to the growth of CuPc films, which is attributed to the increased work function of graphene after O-2 plasma treatment. Moreover, the highest occupied molecular orbital leading edge of CuPc locates at similar to 0.80 eV below substrate Fermi level on O-2 plasma treated graphene, whereas it locates at similar to 1.10 eV on pristine graphene. Our findings provide detailed information regarding the electronic structure at CuPc/graphene and CuPc/O-2 plasma treated graphene interfaces. The increased work function in combination with the relatively smaller energy offset between the highest occupied molecular orbital of CuPc and Fermi level of O-2 plasma treated graphene facilitates the extraction of holes at the interface, and hence paves the way for improving the performance of graphene-based organic photovoltaic cells.