• 文献标题:   Dual-Gate Graphene/h-BN/GaSe Metal-Insulator-Semiconductor Field-Effect Transistor (MISFET)
  • 文献类型:   Article
  • 作  者:   ABDERRAHMANE A, JUNG PG, WOO C, KO PJ
  • 作者关键词:   2d material, dualgate field effect transistor, gallium selenide, graphene, hexagonal boron nitride
  • 出版物名称:   PHYSICA STATUS SOLIDI AAPPLICATIONS MATERIALS SCIENCE
  • ISSN:   1862-6300 EI 1862-6319
  • 通讯作者地址:  
  • 被引频次:   0
  • DOI:   10.1002/pssa.202100818 EA MAY 2022
  • 出版年:   2022

▎ 摘  要

2D transition metal chalcogenides (TMCs) and dichalcogenides (TMDCs) are promising candidates for next-generation electronic devices and sensors. Herein, the fabrication and characterizations of back-gated Si/SiO2/GaSe-based (GaSe: gallium selenide) metal-oxide-semiconductor field-effect transistors (MOSFETs) and top-gated Gr/h-BN/GaSe-based (h-BN: hexagonal boron nitride) metal-insulator-semiconductor field-effect transistors (MISFETs) with a common active layer (GaSe) are reported. The morphological, electrical, and optoelectronic properties are investigated, and the device is found to exhibit p-type behavior with good electrical tunability. At a laser power of 1.147 mu W, the device exhibits a photoresponsivity of 90 mA W-1, I-ON/I-OFF ratios exceeding 10(4), and long decay times. These promising experimental results can promote the application of GaSe-based MISFETs in multifunctional electronic devices.