• 文献标题:   Temperature Dependent Current Transport Mechanism in Graphene/Germanium Schottky Barrier Diode
  • 文献类型:   Article
  • 作  者:   KHURELBAATAR Z, KIL YH, SHIM KH, CHO H, KIM MJ, KIM YT, CHOI CJ
  • 作者关键词:   graphene, ge, si, schottky barrier height, ideality factor, schottky barrier inhomogeneitie, gaussian distribution
  • 出版物名称:   JOURNAL OF SEMICONDUCTOR TECHNOLOGY SCIENCE
  • ISSN:   1598-1657 EI 2233-4866
  • 通讯作者地址:   Chonbuk Natl Univ
  • 被引频次:   8
  • DOI:   10.5573/JSTS.2015.15.1.007
  • 出版年:   2015

▎ 摘  要

We have investigated electrical properties of graphene/Ge Schottky barrier diode (SBD) fabricated on Ge film epitaxially grown on Si substrate. When decreasing temperature, barrier height decreased and ideality factor increased, implying their strong temperature dependency. From the conventional Richardson plot, Richardson constant was much less than the theoretical value for n-type Ge. Assuming Gaussian distribution of Schottky barrier height with mean Schottky barrier height and standard deviation, Richardson constant extracted from the modified Richardson plot was comparable to the theoretical value for n-type Ge. Thus, the abnormal temperature dependent Schottky behavior of graphene/Ge SBD could be associated with a considerable deviation from the ideal thermionic emission caused by Schottky barrier inhomogeneities.