▎ 摘　　要

Precise tuning chemistry and tailoring nanopores of graphene oxide (GO) thin films are vital for their application for liquid and gas separation. In this work, ultra-thin GO films with thicknesses of about 150 nm were prepared and then modified by a low energy carbon ion beam with ion fluences ranging from 1 x 10(15) ions.cm(-2) to 1 x 10(17) ions.cm(-2). An ion fluence of 1 x 10(16) ions.cm(-2) is a threshold for the changes to the surface geometry (i.e. the chemical state and the consequent morphology) of the GO films. Moreover, X-ray photoelectron spectroscopy (XPS) reveals that oxygen loss in ion beam-induced reduction of GO films was mainly by the elimination of the unstable C=O species. Raman spectroscopy indicates that a mass of defects with a mean defect distance of about 1.4 nm was generated in GO films by C+ irradiation. According to SRIM simulation, an average of 208 carbon vacancies were created in the GO film per impinging C+. These results suggest that low energy carbon ion beam irradiation is promising for simultaneously reducing and drilling nanoscale pores on GO surfaces in a controllable manner, which could be used for engineering GO-based separation membranes.