• 文献标题:   Band gap engineering for single-layer graphene by using slow Li+ ions
  • 文献类型:   Article
  • 作  者:   RYU M, LEE P, KIM J, PARK H, CHUNG J
  • 作者关键词:   singlelayer graphene, tunable band gap, li+ iondoping
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   Pohang Univ Sci Technol
  • 被引频次:   9
  • DOI:   10.1088/0957-4484/27/31/31LT03
  • 出版年:   2016

▎ 摘  要

In order to utilize the superb electronic properties of graphene in future electronic nano-devices, a dependable means of controlling the transport properties of its Dirac electrons has to be devised by forming a tunable band gap. We report on the ion-induced modification of the electronic properties of single-layer graphene (SLG) grown on a SiC(0001) substrate by doping low-energy (5 eV) Li+ ions. We find the opening of a sizable and tunable band gap up to 0.85 eV, which depends on the Li+ ion dose as well as the following thermal treatment, and is the largest band gap in the pi-band of SLG by any means reported so far. Our Li 1s core-level data together with the valence band suggest that Li+ ions do not intercalate below the topmost graphene layer, but cause a significant charge asymmetry between the carbon sublattices of SLG to drive the opening of the band gap. We thus provide a route to producing a tunable graphene band gap by doping Li+ ions, which may play a pivotal role in the utilization of graphene in future graphene-based electronic nano-devices.