▎ 摘　　要

Distortion in the fabrication of the nanoparticle in the process of the lithography affects the absorption of a nano antenna. In this paper, we have used the graphene as a part of the substrate for compensating the effect of these distortions. In this study, we have investigated rectangular nano particle as our basic nano particle which are placed over a SiN substrate as a spacer. We have utilized the graphene layer with thickness of 2 nm under the nano particle and then various distortions is modeled and applied by small spherical array. In optical domain, we have studied the effect of distortions on the nano particle reflection. We have checked the graphene effect for compensation the frequency shift that made by the distortions. We also replaced the graphene layer with SiN to show that how much the graphene is affected on reflection controlling. Furthermore the distortion volume has been considered and compared to the rectangular element. The result shows that the relaxation time and temperature have less effect on the absorbency and chemical potential is the main parameter for compensation. This method can be considered for calibration the nano antenna and the optical absorber. (C) 2018 Elsevier GmbH. All rights reserved.