• 文献标题:   Enhanced ultraviolet photoresponse in a graphene-gated ultra-thin Si-based photodiod
  • 文献类型:   Article
  • 作  者:   LI GL, ANDRE N, HUET B, DELHAYE T, RECKINGER N, FRANCIS LA, LIAO L, RASKIN EP, ZENG Y, FLANDRE D
  • 作者关键词:   graphene, transparent gate, pin photodiode, silicononinsulator, ultra thin, backside illumination, ultraviolet detection
  • 出版物名称:   JOURNAL OF PHYSICS DAPPLIED PHYSICS
  • ISSN:   0022-3727 EI 1361-6463
  • 通讯作者地址:   Hunan Univ
  • 被引频次:   6
  • DOI:   10.1088/1361-6463/ab12b8
  • 出版年:   2019

▎ 摘  要

We present an ultra-thin lateral SOI PIN photodiode with transferred monolayer graphene as the transparent gate, to provide enhanced ultraviolet (UV) performance and mechanical flexibility beyond standard Si-based devices. The device dark current shows intact characteristics after the post-CMOS thinning and graphene transfer processing steps. The device responsivity presents high potential in UV and visible wavelength detections (i.e. within the 200-900 nm range) under monochromatic light illumination. A maximum responsivity of 0.18 A W-1 has been experimentally achieved at 390 nm wavelength and validated by simulation, for a diode with intrinsic length L-i of 20 mu m. Additionally, the similar to 5 mu m-thick device chip with direct board assembly paves the way towards the development of hybrid flexible electronics.