• 文献标题:   Controllable and air-stable graphene n-type doping on phosphosilicate glass for intrinsic graphene
  • 文献类型:   Article
  • 作  者:   PARK HY, YOON JS, JEON J, KIM J, JO SH, YU HY, LEE S, PARK JH
  • 作者关键词:  
  • 出版物名称:   ORGANIC ELECTRONICS
  • ISSN:   1566-1199 EI 1878-5530
  • 通讯作者地址:   Sungkyunkwan Univ
  • 被引频次:   6
  • DOI:   10.1016/j.orgel.2015.03.039
  • 出版年:   2015

▎ 摘  要

We proposed and investigated a controllable air-stable graphene n-doping method on phosphosilicate glass (PSG) to achieve intrinsic graphene. Through Raman, XPS, and AFM analyses, it was confirmed that the initially p-type doped graphene was recovered to intrinsic graphene through n-type doping phenomenon. The n-doping control was accomplished by adjusting the concentration of the out-diffused P2O5 molecules from the PSG layer. In particular, a larger amount of P2O5 molecules and a smoother PSG surface were achieved after the higher temperature annealing, consequently yielding a larger doping impact on the graphene layer. Finally, a very small Dirac point shift (1-3 V) was observed after 96 h of air exposure, compared to the degree of shift by the n-doping effect (17-36 V), demonstrating that this n-doping method is fairly stable in air. (C) 2015 Elsevier B.V. All rights reserved.