• 文献标题:   Extraction of intrinsic field-effect mobility of graphene considering effects of gate-bias-induced contact modulation
  • 文献类型:   Article
  • 作  者:   LEE CJ, PARK H, KANG J, LEE J, CHOI M, PARK H
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-8979 EI 1089-7550
  • 通讯作者地址:   Kyungpook Natl Univ
  • 被引频次:   0
  • DOI:   10.1063/1.5128050
  • 出版年:   2020

▎ 摘  要

Carrier mobility is one of the most important parameters to evaluate the quality and uniformity of graphene. The mobility of graphene is typically extracted from the transconductance of a field-effect transistor fabricated with the graphene layer. However, the mobility value evaluated by this method is imprecise when the contact resistance is non-negligible, or the contact resistance is modulated by the gate bias, which is the case for typical graphene field-effect transistors. Here, we suggest a method for extracting the precise intrinsic field-effect mobility by considering the effective bias across the channel and its gate-induced modulation. We show that the contact resistances of typical graphene field-effect transistors are significantly modulated by gate bias and conventional methods can, therefore, cause a considerable error in the evaluation of the mobility. The proposed method in which the contact-induced error is removed gives a channel-length-independent intrinsic field-effect mobility. This method can be generally used to correctly evaluate the field-effect mobility of nano-scale or low-dimensional materials.